Optical System Design in OpticStudio

This course provides a solid introduction to the OpticStudio sequential design environment, and this is intended for those with a background in optics. Attendees will acquire the skills to design, optimize and tolerance imaging systems through hands-on examples and exercises that simulate actual design challenges.

Topics include:

  • Glass and refractive index
  • First and third-order optics
  • Aberration descriptions
  • Optimization
  • Image simulation
  • Diffraction and MTF
  • Three-dimensional optical systems
  • Local and global coordinate systems
  • Tilts, decenters, folds and scanning mirrors
  • Tolerancing for manufacturing

All courses have a minimum attendance requirement.  If the course cannot meet the minimum attendance, students will be notified of the course cancellation no later than 2 weeks prior to the event.                                                                          
Prerequisites: 

A background in Optics is required for this course. For those form different engineering disciplines, we strongly encourage attending Fundamentals of Optics prior to attending this course. No prior knowledge of OpticStudio is required.

Duration: 5 days


Schedule:

May 23 - 27 United Kingdom
June 13 - 17 Seattle Area
July 25 - 29 San Francisco Area
August 22 - 26 United Kingdom
September 12 - 16   Boston Area
October 24 - 28 San Francisco Area
November 14 - 18 United Kingdom




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